TY  - JOUR
AU  - Jiménez-Sáez, José Carlos
AU  - Muñoz, Sagrario
AU  - Palacios, Pablo
PY  - 2026
DA  - 2026/04/24
TI  - Early Stages of Low-Energy Pattern Formation in Ar Cluster Bombardment
JO  - Recent Progress in Science and Engineering
SP  - 006
VL  - 02
IS  - 02
AB  - Molecular dynamics is an essential tool for studying the formation of surface patterns in their early stages under low-energy bombardment. Recently, it has been shown that semiconductor surfaces such as Si can reorganize under ultra-low-energy conditions to form surface patterns. In this work, we investigate the formation of patterns on metal surfaces under these conditions. To accelerate the process, a longitudinal substrate model was employed, with clusters selected as projectiles. As is well known, pattern formation is influenced by two factors: atomic redistribution and sputtering. Both factors vary with the angle of incidence, though sputtering appears to be the determining factor at grazing angles. As energy decreases, both factors diminish significantly, with the reduction in sputtering being greater. Since pattern formation is not observed, this effect could be attributed to sputtering, given the net atom balance.
SN  - 3067-4573
UR  - https://doi.org/10.21926/rpse.2602006
DO  - 10.21926/rpse.2602006
ID  - Jiménez-Sáez2026
ER  -